Low Temperature Plasma Ashing and Element Quantification
Low temperatue plasma ashing is a technology that enables low temperature combustion of organic material leaving only the inorganic material from the samples. This inorganic material can then be analyzed using our EDX technology, thus revealing the atomic composition of the ash. This technique gives a powerful tool to quantify elements in tissues, including nanoparticles.
Low temperature plasma ashing involves treatment of the sample at only ~ 120 °C, using activated (singlet state) oxygen. This reduces the risk of altering any structure characterizing the inorganic material.
Therefore, using low temperature plasma ashing, at AnaPath we allow the isolation of inorganic material from samples (biological and not) (Figure 1-3). Additionally, due to the relatively low temperature, isolated 3D-structure (e.g. crystal; Figure 2) of the isolated inorganic material is minimal affected by process.
Ash and inorganic material can then be visualised using our Scanning electron microscope, and the chemical composition and relative quantification can be performed.
Finally, at AnaPath, full standardized unit quantification of individual inorganic material can be conducted.
Figure 1
Ashes from a worm sample after undertaking low temperature ashing. The image was taken using a SEM/EDX Phenom Pharos instrument (ThermoFischerScientific). Element mapping (on the right) indicates the atomic composition and concentration (in %) of the inorganic material isolated after the ashing process. X-ray absorbance spectrum is also displayed; here, absorbance peaks for individual elements are also shown.
Figure 2
Crystal structures resulting after ashing low temperature from worm sample The image was taken using a SEM/EDX Phenom Pharos instrument (ThermoFischerScientific). Element mapping (on the right) indicates the atomic composition and concentration (in %) of the inorganic material isolated after the ashing process.
X-ray absorbance spectrum is also displayed; here, absorbance peaks for individual elements are also shown.
Figure 3
Low temperature ashing (using plasma oxygen) performed at AnaPath. 1. and 2. show samples placed in the combustion chamber of the instrument. 3. UV light generated during the plasma ashing processing. 4. Outer of the ashing instrument during sample processing.